The introduction of nanovoxelated elastic moduli in materials fabrication offers new possibilities for 3D printing, enhancing ...

Photoresist (PR) is a key material in photolithography, essential for manufacturing semiconductors, PCBs, and display panels.

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...

For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass substrate. The optimized printing approach could enable super-resolution 3D ...

Researchers developed a new optimized printing approach that could enable super-resolution 3D direct laser writing (DLW) of microlenses, photonics crystals, micro-optical devices, metamaterials and ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

Integrated circuits are patterned by exposing light-sensitive photoresist materials deposited on silicon wafers and then removing the exposed (or sometimes unexposed) areas using low-pressure ...