DuPont will showcase how we are shaping the next generation of electronics at the International Electronic Circuits (Shanghai) Exhibition 2025. With a diverse portfolio of advanced circuit materials ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

“PFAS” is an acronym for per- and polyfluoroalkyl substances. These man-made chemicals migrate into soil, water, and air when ...

The introduction of nanovoxelated elastic moduli in materials fabrication offers new possibilities for 3D printing, enhancing ...

New 3D printing technology achieves 130-fold better precision, allowing nanoscale control over strength and flexibility in printed materials.

The Birmingham spin-out's new CEO will drive the adoption of an innovative platform technology to print the most intricate layers on silicon chips.

Photoresist (PR) is a key material in photolithography, essential for manufacturing semiconductors, PCBs, and display panels. The global PR market is highly concentrated, with Merck, Dow Chemical ...

By effectively removing organic defects while minimizing film loss, it outperforms most post-cleaning and photoresist wet stripping processes. Supporting wafer sizes from 150mm to 300mm, the system ...

"However, by using a unique dual-beam optical setup and a special photoresist, we were able to overcome this challenge and achieve super-resolution DLW." In the Optica Publishing Group journal ...