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The integration simplifies lithography processes and leads to lower materials usage and reduced energy consumption.
In 2024, the global market size of Dry Film Photoresist was estimated to be worth USD 939 million and is forecast to reach approximately USD 1191 million by 2031 with a CAGR of 3.5% during the ...
Breaking Taps on MSN15d
How I Pattern Microstructures Without a PhotomaskUsing a direct-write laser system, I created micro-scale patterns in photoresist—no masks, no cleanroom. This is how maskless lithography works for prototyping and research.
A new technical paper titled “Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach” was published by researchers at imec ...
EUV Tech (EUVT), a global leader in designing and manufacturing at-wavelength EUV metrology equipment, is excited to announce the release of the FALCON Photoresist Flood Exposure Tool. As our ...
Asahi Kasei has developed the Sunfort TA series of dry film photoresist for next-generation semiconductor packages requiring circuit patterns with line/space widths of 2/2 µm or less. The film offers ...
--Lam Research Corporation today announced that Aether ®, its innovative dry photoresist technology, has been selected by a leading memory manufacturer as production tool of record for the most ...
We forecast the photoresist market will grow at a CAGR of +14% to around ¥427.7bn by 2026. The increasing complexity of lithography processes is likely to make a substantial contribution to growing ...
HANGZHOU, ZHEJIANG, CHINA, November 1, 2024 / EINPresswire.com / -- Novel cationic photoresist with enhanced sensitivity and speed revolutionizes high-throughput 3D nanofabrication for advanced ...
The cutting-edge photoresist, dubbed as T150, achieves a stunning resolution of 120 nanometers in lithography, with greater tolerance, higher stability, and exceptional film retention after baking.
DuPont de Nemours Inc. DD recently announced the completion of a considerable expansion of photoresist manufacturing capacity at its Sasakami Site in Agano-shi, Niigata, Japan.
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