A multinational research team, including engineers from the University of Cambridge and Zhejiang University, has developed a ...

The top layer of ZEP520 is more efficient than other resists (PMMA etc.) for e-beam lithography, due to its high resolution and high sensitivity. Here, a set of process parameters have been optimized ...

Focused Ion Beam Lithography is a very powerful technique for directly writing patterns on many substrates Cl], it is a mask-less and resist-less technique that allows a very wide range of ...

In our approach, a silicon surface is first patterned with gold, using “lift-off” electron-beam lithography (“top-down”), and the resulting pattern is then amplified by surface-initiated ...

Rapidus Corp., a manufacturer of advanced logic semiconductors, announced the delivery and installation of ASML’s EUV lithography equipment at its Innovative Integration for Manufacturing (IIM-1) ...

Hydrogen silsesquioxane (HSQ) offers high-resolution patterning capabilities in electron beam lithography. However, electron scattering within the resist remains challenging to detect, complicating ...

The Supra FESEM is primarily used for high resolution electron beam lithography and imaging purposes. Learn more... The Elionix ELS 7700 is a dedicated 75 kV electron beam lithography system. Equipped ...