Design-Reuse7d
MAPPER and TSMC Take Next Step in Exploring Multiple E-beam Lithography for IC Manufacturing at 22 nanometer node and Beyond
This platform gives TSMC the opportunity to take the next step forward in exploring multiple e-beam technology as a lithography option at 22 nanometer and more advanced process nodes. Multiple e-beam ...
The Victoria Advocate13d
Samsung Electronics and Nova Jointly awarded the Vladimir Ukraintsev Award at the SPIE Advanced Lithography conference
and Hybrid Machine Learning" has been selected as the winner of the Vladimir Ukraintsev Award for "Collaborations in Metrology" at SPIE's 2024 Advanced Lithography + Patterning Conference.
IEEE25d
A 4.15GHz super high frequency quartz resonator based on electron-beam lithography
This paper utilizes a compound optimization algorithm to design a super high frequency quartz resonator with a center frequency of 4.15GHz and successfully fabricates the device using electron beam ...
C&EN17d
Low-Temperature Contacts and the Coulomb Blockade Effect in Layered Nanoribbons with In-Plane Anisotropy
Quantum Innovation Centre (Q. InC), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore Institute of Materials Research and ...