High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.
Nova (Nasdaq: NVMI) today announced that its co-authored paper with Samsung Electronics on "On-Cell Thickness Monitoring of Chalcogenide Alloy Layer using Spectral Interferometry, Raman Spectroscopy, ...
Interesting Engineering on MSN9d
China’s breakthrough solid-state deep ultraviolet laser could transform chipmakingA new solid-state laser developed could transform semiconductor chip manufacturing, providing an alternative to gas-based ...
The paper demonstrates the application of Nova's novel technologies in advanced process control by utilizing its unique and differentiated solutions. The thickness of the chalcogenide Ovonic ...
Researchers develop a fabrication technique to overcome design and performance challenges for scalable single-photon ...
The slate debuts TCL's Nxtpaper 4.0 screen technology. TCL shared more details about its Nxtpaper 11 Plus tablet at MWC Barcelona 2025. The device ...
ITWeb on MSN21d
Rigaku Wins Diana Nyyssonen Memorial Best Paper Award with Method for Inspecting and Measuring Defects in 3D Flash MemoryThe Award is conferred on the team that delivers the most compelling paper in the fields of measurement, inspection and process control at the SPIE Advanced Lithography + Patterning Conferences. These ...
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