Delft, The Netherlands / Hsinchu, Taiwan -- Ocotober 13, 2008 -- MAPPER Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) signed an agreement, according to which MAPPER will ship its ...

Centre for Nanoscience and Engineering, Indian Institute of Science, Bengaluru, Karnataka 560012, India ...

Here, quantum devices on a chip are patterned via direct-write electron-beam lithography in a nanofabrication facility. Written & patterned by Onri Jay Benally, an Indigenous American quantum hardware ...

College of Optical and Electronic Technology, China Jiliang University, Hangzhou, Zhejiang 310018, China Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of ...

China’s semiconductor industry is continuing to make incremental steps in advancing its domestic lithography tools ... The other system uses a more advanced argon fluoride (ArF) light source ...

However, achieving phase synchronization in a coherent beam-combining (CBC) system is a significant challenge. The predominant approach for tackling this challenge is the utilization of advanced ...

Photolithography is employed for fabrication due to its high efficiency compared to electron beam lithography. By utilizing a folded design, the length of the modulator is reduced to a third. A ...

JENA, Germany, Jan. 10, 2024 /PRNewswire/ — Jenoptik is investing a low double-digit million-euro amount in a state-of-the-art system for the high-tech fab currently under construction in Dresden. The ...

Hirokazu Yamada, a board member and the director of the Mask Lithography Division of NuFlare, sat down with Semiconductor Engineering to discuss photomask technology, e-beam mask writer trends and ...