Achieving integration of semiconducting and superconducting qubits with full industrial 300-mm wafer fabrication.

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at Huawei's Dongguan facility, according to XFastest and Wccftech. Trial ...

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing ...

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea Department of Materials Science ...

What does all this mean? Subtractive patterning is most used for wirebond BGA substrates where line/space requirements are >35/35 um. The starting point is a copper clad laminate (CCL) core. It ...

Barring a major breakthrough in lithography, chipmakers are using today’s 193nm immersion and multiple patterning for both 16/14nm and 10nm. Now, chipmakers are focusing on the lithography options for ...