It provides sufficient irradiation dose for photoresist exposure in a short time, creating a new path for semiconductor manufacturing." "In recent years, the low-cost and high-precision maskless ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

Integrated circuits are patterned by exposing light-sensitive photoresist materials deposited on silicon wafers and then removing the exposed (or sometimes unexposed) areas using low-pressure ...

T he fabrication facility contains a 3" contact mask alignment and photoresist exposure system, fume hoods, spin coating station, non-contact wafer profilometer, PDMS mixer and degasser, oven, AC ...