News

Xanadu (xanadu.ai), a world leader in photonic quantum computing, and Mitsubishi Chemical, have launched a joint project to use quantum computing for the advancement of new semiconductor chip ...
The integration simplifies lithography processes and leads to lower materials usage and reduced energy consumption.
In 2024, the global market size of Dry Film Photoresist was estimated to be worth USD 939 million and is forecast to reach approximately USD 1191 million by 2031 with a CAGR of 3.5% during the ...
A microplasma device utilizing SU-8 photoresist as a barrier rib has been fabricated and characterized operating in the abnormal mode for neon pressures from 300 to 800 torr and having a hexagonal ...
Using a direct-write laser system, I created micro-scale patterns in photoresist—no masks, no cleanroom. This is how maskless lithography works for prototyping and research.
EUV Tech (EUVT), a global leader in designing and manufacturing at-wavelength EUV metrology equipment, is excited to announce the release of the FALCON Photoresist Flood Exposure Tool. As our ...
This paper introduces two novel approaches to effectively eliminate the influence of scattering light from the wafer chuck and enhance the lithography precision of SU-8 photoresist on glass substrate.
Organic optoelectronic materials with localized or delocalized excitation features are widely used in various optoelectronic devices. A data-driven automated workflow was implemented for rapidly ...
A new precursor, SU-8, which is a negative photoresist, was electrospun to produce ultrafine polymeric fibers with a wide range of morphology and wettability characteristics. Electrospun nanofibers of ...