A multinational research team, including engineers from the University of Cambridge and Zhejiang University, has developed a ...

Our deposition facilities can then be used to create structures with various materials. PMMA and MMA e-beam resists are available. Lithography Support Cleanroom facilities: The MORE Center maintains a ...

We investigate PMMA development at lowered temperatures for its effect on the resolution, PMMA trench cleanliness and pattern quality of sub-10 nm e-beam lithography.

Electron-beam lithography (e-beam lithography) is a high-precision nanofabrication technique used to produce patterns with features as small as a few nanometers.

The rigid master is typically prepared via e-beam lithography and has feature sizes in the 10–100 nm size range. Once imprinting of the polymer film has been carried out additional etching can move ...

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].

KemLab Inc. is pleased to offer a high-quality solution tailored to address the requirements of high-resolution direct write e-Beam lithography. HARP PMMA and Copolymer ... KemLab Inc.

KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...

A model that can be plugged into a bigger model by T. Verduin. This model is able to simulate e-beam lithography, and this particular model implements the effect of bondbreaking in PMMA (plastic).