In e-beam lithography, or EBL, shapes are drawn onto a wafer using an electron beam in a vacuum chamber. This is a slow process compared to optical lithography, as used in mass production, but it ...

Our deposition facilities can then be used to create structures with various materials. PMMA and MMA e-beam resists are available. Lithography Support Cleanroom facilities: The MORE Center maintains a ...

KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...

Electron-beam lithography (e-beam lithography) is a high-precision nanofabrication technique used to produce patterns with features as small as a few nanometers.

Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better.

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents.

In e-beam lithography, or EBL, shapes are drawn onto a wafer using an electron beam in a vacuum chamber.