Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

with a resolution down to several tens of nanometres. An extension of this technology could be an alternative option for next-generation, sub-13.5-nm lithography. Many of the technical issues ...

Soft lithography and 3D printing are two nanofabrication techniques, each offering advantages for microfluidics and ...

Computational lithography uses various techniques of resolution enhancement technology (RET) to create more perfect images on the chip as the elements of the transistor get smaller and smaller.

soft lithography employs elastomeric materials, typically polydimethylsiloxane (PDMS), to create patterns and structures with high fidelity and resolution. This versatile technique enables the ...

low resolution, high energy consumption, low light efficiency, and insufficient optical power density. To overcome these challenges, the research team built a maskless lithography prototype ...