High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.
Nova (Nasdaq: NVMI) today announced that its co-authored paper with Samsung Electronics on "On-Cell Thickness Monitoring of Chalcogenide Alloy Layer using Spectral Interferometry, Raman Spectroscopy, ...
The paper demonstrates the application of Nova's novel technologies in advanced process control by utilizing its unique and differentiated solutions. The thickness of the chalcogenide Ovonic ...
Researchers develop a fabrication technique to overcome design and performance challenges for scalable single-photon ...
Interesting Engineering on MSN4d
China’s breakthrough solid-state deep ultraviolet laser could transform chipmakingA new solid-state laser developed could transform semiconductor chip manufacturing, providing an alternative to gas-based ...
TipRanks on MSN9d
Nova and Samsung Win Prestigious Metrology AwardAn update from Nova ( ($NVMI) ) is now available. On March 18, 2025, Nova Ltd. announced that its collaborative paper with Samsung Electronics, ...
ITWeb on MSN16d
Rigaku Wins Diana Nyyssonen Memorial Best Paper Award with Method for Inspecting and Measuring Defects in 3D Flash MemoryThe Award is conferred on the team that delivers the most compelling paper in the fields of measurement, inspection and process control at the SPIE Advanced Lithography + Patterning Conferences. These ...
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