Photoresist (PR) is a key material in photolithography, essential for manufacturing semiconductors, PCBs, and display panels.

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...

The introduction of nanovoxelated elastic moduli in materials fabrication offers new possibilities for 3D printing, enhancing ...

For the first time, researchers have used high-speed laser writing to create lines spaced just 100 nm apart on a glass substrate. The optimized printing approach could enable super-resolution 3D ...

Researchers developed a new optimized printing approach that could enable super-resolution 3D direct laser writing (DLW) of microlenses, photonics crystals, micro-optical devices, metamaterials and ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

Integrated circuits are patterned by exposing light-sensitive photoresist materials deposited on silicon wafers and then removing the exposed (or sometimes unexposed) areas using low-pressure ...