[Zach] used PMMA, commonly known as acrylic plastic ... which is seriously impressive for such a relatively simple setup. These e-beam lithography experiments follow on from [Zach]’s earlier ...

This platform gives TSMC the opportunity to take the next step forward in exploring multiple e-beam technology as a lithography option at 22 nanometer and more advanced process nodes. Multiple e-beam ...

EBL is a high-resolution lithography technique that uses a focused electron beam to write patterns on ... Coating the substrate (e.g., silicon or quartz) with an electron-sensitive resist, such as ...