L. Zavyalova, A. Robinson, A. Bourov, N. Lafferty, B. W. Smith, "On the quality of measured optical aberration coefficients using phase wheel monitor", Proc. SPIE ...
To achieve the required 10% uniformity of the printed linewidths even for low-κ 1 processes, the aberrations of the lithography lenses have to be reduced to an extremely low level of just a few ...
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